VICTORY Process is a general purpose 3D process simulator. VICTORY Process includes a complete process flow core simulator and three advanced simulation modules: Monte Carlo Implant, Advanced Diffusion and Oxidation, and Physical Etch and Deposit. Proprietary models, as well as public domain research models, can be easily integrated into VICTORY Process using the open modeling interface. The Interactive Tools are a suite of applications that provide interactive GUI-based pre and post processing services to Silvaco’s 1D, 2D and 3D TCAD simulators. The tools within the interactive tools suite are fully integrated and provide users with a comfortable environment within which all TCAD simulations can be performed. Key Features Sophisticated multi-particle flux models for physical deposition and etching with substrate material redeposition Extremely accurate and fast Monte Carlo implant simulation Comprehensive set of 3D diffusion models: Fermi, three-stream, and five-stream 3D physical oxidation simulation with stress analysis Fast 3D structure prototyping capability enables the in-depth physical analysis of specific processing issues Accurately predicts 3D topology and 3D dopant distribution Automatic meshing and Adaptive Mesh Refinement Efficient multi-threading of time critical operations of Monte Carlo implantation, diffusion, oxidation, and physical etching and deposition Open architecture allows easy introduction and modification of customer specific physical models Seamless link to 3D device simulators including structure mirroring, adaptive doping refinement and electrode specification Silvaco's strong encryption is available to protect valuable customer and third party intellectual property. Core Process Simulator VICTORY Process Core Simulator provides a convenient platform for fast simulation of all important process steps in 3D. Fast Geometrical Etch and Deposition Idealized isotropic etching Idealized conformal deposition Selective etching or complete removal of material regions Idealized full structure or selective material planarization Mask pattern with tilted sidewalls or rounded corners Mask pattern transfer by vertical or dry etching Mask pattern transfer of aerial images Mask polygon definition within the input deck Supports mask feature variations (shrink and expand) Supports GDSII and MaskViews mask formats